The parallel fabrication of multiple photodetectors is based on the guided growth of ZnSe nanowires. In the first step we choose the starting point of the nanowires by designing a photolithography mask in order to create a pattern of a gold catalyst. This step is done with standard photolithography followed with electron-beam-deposition of a thin gold film and a lift off process.
In the second step guided nanowires are grown from the gold catalyst in a standard chemical-vapor-deposition growth.
In the third and last step we exploit our a-priori knowledge of the growth direction of the nanowires in order to design a second Photolithography mask that defines an electrode pattern that is compatible to the catalyst pattern of the guided nanowires. Now followed by a standard photolithography process, Ti/Au (10 nm/50 nm) electrodes were deposited over the guided Nanowires using electron-beam-deposition to form photodetectors.
