Mathematical model of deposition process of multilayer coatings based on intermetallic Ti-Al system by vacuum arc plasma considering diffusion processes

The physical and chemical processes occurring during layer-by-layer deposition of multilayers coatings based on intermetallic Ti-Al system by vacuum arc plasma with diffusion processes in thin films were investigated. Influence of technological parameters of deposition (arc current, voltage) on the rate of growth of layers of titanium and aluminum were investigated theoretically and experimentally. The processes occurring in the deposition of coatings based on intermetallic Ti-Al system by vacuum arc plasma were mathematically described. Diffusion processes were simulated using the finite element method by Comsol multiphysics software. The simplified 2D model of architecture of multilayer coatings consisting of several rectangles, whose height corresponds to the calculated thicknesses of Ti and Al layers was created. Diffusion processes occurring between layers of Ti and Al were modeled by using the Fick equations. Software based on developed mathematical model was developed that allows to calculate the optimal deposition modes of coatings based on intermetallic Ti-Al system. Influence of the deposition conditions on the content of intermetallic compounds in the coating was established by X-ray diffraction methods. Results of mathematical model of deposition multilayer coatings considering diffusion processes were compared with experimental data.