Climb of edge dislocation loops via pipe diffusion during nanoindentation

Dan Mordehai Shyamal Roy
Mechanical Engineering, Technion - Israel Institute of Technology

In this work, we explore the role of dislocation climb in annihilating the dislocation microstructure produced during nanoindentation. We produce creep conditions in Molecular Dynamics (MD) simulations of nanoindentation and show that half prismatic edge dislocation loops annihilate via pipe diffusion of vacancies from the free surface. Inspired by the MD simulations, we develop a model for the annihilation rate of these loops via pipe diffusion and compare it with the contribution of bulk diffusion. The model allows us discussing the temperatures at which we expect climb to prevail in experimental conditions and explain why climb is imperative during nanoindentation experiments, especially at elevated temperatures.

Dan Mordehai
Prof. Dan Mordehai
Technion








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