About the Synthesis of Vanadium Oxides Applying Chemical Vapor Deposition Technique and the Evolution along the Reaction Axis

High-temperature gas-phase synthesis of solid phase functional materials serves wide range of applications on laboratory and industrial scales. One of the most widespread utilizations of the gas phase synthesis is the fabrication of catalytic materials. Oxides of vanadium are widely used in catalytic protocols for pollution abatement, synthetic fuel production etc.

Chemical vapor deposition (CVD) is a technique that allows synthesis of thin films in a high temperature reaction cell. In this technique the chemical reaction of material formation occurs in gas phase, followed by vapor deposition on the top of surface or template. In this work thin films of vanadia which deposited on silica substrate was fabricated and studied.

The characteristics of the resulting thin film is highly dependent on the deposition conditions like pressure and temperature, but it also dependent on the residence time of the gas phase species before the deposition on the substrate. In this study the properties of the produced thin films in different positions along the reaction line (and as a result has different residence time of the gas phase species before deposition) was analyzed by SEM micrograph, X-ray diffraction and resistivity measurements and the evolution of the product along the reaction line was investigated.