Magnetic Lithography – A New Method for Patterning Flat and non-Flat Surfaces

Magneto-lithography (ML) is based on patterning magnetic field on a substrate, using paramagnetic or diamagnetic masks that define the shape and strength of the magnetic field. We demonstrate the use of various methods of ML for common microelectronic processes such as etching and deposition. In principle, high resolution can be obtained by applying simple and inexpensive tools. Hence, ML has the potential to become the method of choice in the future, both in the microelectronic industry as well as for chemical patterning of surfaces. The first step in ML is to pattern the magnetic field strength on the substrate, using a permanent magnetic field applied perpendicular to the substrate and paramagnetic (or diamagnetic) masks that define the spatial distribution and shape of the magnetic field on the substrate. The second component in ML is assembly of ferromagnetic nanoparticles (NPs) onto the substrate in a pattern defined by the field induced by the mask. After processing, namely, either deposition or etching, the NPs are washed away. The ML technique was shown in the past to provide a simple and fast way for chemical and biomaterial patterning of surfaces. ML does not depend on the surface topography and planarity and that it can be used for patterning non-flat and the inside surfaces of a closed volume. ML method opens up new possibilities in high-throughput surface patterning.

Bardea and A. Yoffe, IEEE Trans. on Nanotechnology, 16, (2017).