ICS84

Contributed
From nano to nano: Electrochemical deposition using nanomaterials as building blocks

Daniel Mandler Liang Liu
Institute of Chemistry, The Hebrew University, Jerusalem, Israel

Electrochemical deposition (ED) dates back to Faraday and is a well-established approach for producing coatings. This presentation will summarize novel ED approaches, where nanostructured films are deposited, starting with nanomaterials as building blocks, instead of molecular or ionic species. This “nano to nano” deposition concept has a significant advantage of directly transferring nano-objects from the dispersion to the coating, which maintains their unique nanoscale properties. It is achieved via destabilizing the nano-objects in the dispersions by applying electrochemical potential or current, which diminishes interparticle repulsion. Three different mechanisms have been explored, so far, for the ED of nanomaterials: (a) Direct redox induced deposition; (b) Indirect pH and ionic strength induced deposition; (c) Matrix induced co-deposition. With the latter two mechanisms, the “nano to nano” approach can be applied to electrochemically inactive and non-conductive nanomaterials. The deposition process is selective to conductive substrates and can be manipulated by potential/current and time, yielding films with thickness from nanometers to a few micrometers. Using these approaches we have been able to deposit a wide variety of nanomaterials spanning from carbon nanotubes and graphene to 2D nanomaterials, such as MoS2, and hydroxyapatite. We will present various applications includign coating of medical implants and electrochromic and thermochromi materials. Challenges and prospects will also be discussed.

References:

Levy, I.; Magdassi, S.; Mandler, D. Electrochim. Acta 2010, 55, 8590-8594.

Liu, L.; Layani, M.; Yellinek, S.; Kamyshny, A.; Ling, H.; Lee, P. S.; Magdassi, S.; Mandler, D. J. Mater. Chem. A 2014, 2, 16224-16229.

Liu, L.; Yellinek, S.; Tal, N.; Toledano, R.; Donval, A.; Yadlovker, D.; Mandler, D. J. Mater. Chem. C 2015, 3, 1099-1105.

Geuli O., Metoki N., Eliaz N. and Mandler D., Adv. Funct. Mater. 2016, 26, 8003-8010.

Rastogi P. K., Sarkar S. and Mandler D., Appl. Mater. Today, 2017, 8, 44-53.

Geuli O., Metoki N., Zada T., Reches M., Eliaz N. and Mandler D., J. Mater. Chem. B, 2017, 5, 7819-7830.









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