Complex oxides` ferroelectric and piezoelectric properties make it attractive to integrate them as thin films or nanostructures on a Si substrate for use in nanoelectronics, communication devices, electromechanical systems, or sensors1. This epitaxial integration leads to the modification of various material properties. Strain and atom displacements are particularly concerned because they alter spontaneous polarization and may result in the polarization reversal2. Complex oxides are made up of more than two types of sublattices, each of which can be strained and/or shifted differently, although sharing a common Bravais lattice3. Thus, strain and atomic displacements must be measured for each sub-lattice individually and in relation to others.
Here, we propose a method for the reciprocal space treatment of high-resolution scanning transmission electron microscopy (HR-STEM) images. Named “Absolute strain” (AbStrain), it allows for quantification and mapping of interplanar distances and angles, displacement fields and strain tensor components with reference to a user-defined virtual real lattice, as well as for their correction from the image distortions specific to HR-STEM imaging. The mathematical formalism for AbStrain will be presented. When a crystal is made up of two or more types of atoms, the technique for extracting images of the sub-lattices and measuring absolute and polarization related displacements will be described. We will demonstrate a successful application of AbStrain to HR-STEM images of functional oxide ferroelectric structures. The advantages of AbStrain with respect to existing methods like geometric phase analysis4 and “peak finding”5 will be discussed.
References:
1. L. Mazet et al. Sci. Technol. Adv. Mater. 16 (2015).
2. L. Baudry et al, Phys. Rev. B 91 (14) (2015).
3. D. P. Kumah et al, Appl. Phys. Lett. 97 (25) (2010).
4. M. J. Hÿtch et al, Ultramicroscopy 74 (3) (1998).
5. M. Nord et al, Adv. Struct. Chem. imaging 3(1), 9 (2017).